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Ibis Technology Corp (fka IBIS) RSS Feed

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http://www.ibis.com/ http://finance.yahoo.com/q/ks?s=IBIS Ibis Technology Corporation engages in the development, manufacture, and marketing of Separation by Implantation of Oxygen and Silicon-On-Insulator (SIMOX-SOI) implantation equipment for the semiconductor industry worldwide. SIMOX is a form of SOI technology that creates an insulating barrier below the top surface of a silicon wafer. The company’s proprietary oxygen implanters produce SIMOX-SOI wafers by implanting oxygen atoms just below the surface of a silicon wafer to create a very thin layer of silicon dioxide between the thin operating region of the transistor at the surface and the underlying silicon wafer itself. The buried layer of silicon dioxide acts as an insulator for the devices fabricated on the surface of the silicon wafer and reduces the electrical current leakage. Its SIMOX-SOI wafers and finished integrated circuits are used in various commercial applications, including servers and workstations; portable and desktop computers; wireless communications and battery powered devices, such as laptop computers, personal digital assistants, and mobile phones; integrated optical components; and harsh-environment electronics. The company was founded in 1987 and is based in Danvers, Massachusetts. Gallery View 4: (Full Sto, MACD, Aroon8)
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